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Design : Our design and simulation work is carried by a combination of various simulation tools that are available to us, e.g. plane wave expansion (PWE), rigorous coupled wave analysis (RCWA), and finite difference time domain (FDTD) codes.
Nano Fabrication: We fabricate our samples in house at the Hebrew university the micro fabrication laboratory of the applied physics department (equipped with MJB3 mask Aligner, wet benches, oxidation and diffusion ovens, e-gun evaporator and LPCVD system) and the unit for nanofabrication at the Hebrew University Nanocenter, (equipped with e-beam lithography and photolithography tools, metal deposition instruments, RIE/ICP, PECVD, glove box, packaging tools, and characterization tools, e.g. profiler, microscopes, thickness measuring instrument, probe station, etc.)
Experimental characterization: We characterize our devices in the nanophotonic characterization laboratory headed by Uriel Levy. The lab was established in 2007. It includes 4 optical tables and state of the art characterization equipment including large variety of lasers in the UV, visible, and the near IR range (including a Ti-Sapphire laser, Pulsed Nd-YAG lasers and tunable semiconductor lasers), optical spectrum analyzer, fast oscilloscopes, power sources, function generators, CCD cameras, fiber-waveguide alignment system, and microfluidic assemblies for operating microfluidic devices. Our lab is equipped with a near field scanning optical microscope (NSOM).
Structural characterization : For structural characterization we use the unit for nano characterization at the nanocenter of the Hebrew University. Primarily we use the high resolution SEM and the AFM.
