@article {26865,
	title = {Non-Bulk Morphologies of Extremely Thin Block CopolymerFilms Cast on Topographically Defined Substrates FeaturingDeep Trenches: The Importance of Lateral Confinement},
	journal = {Polymers},
	volume = {15},
	year = {2023},
	note = {[["fid":"30465","view_mode":"default","type":"media","attributes":"height":"872","width":"1000","style":"width: 287px; height: 250px; float: left;","alt":"66. Elisheva deep trenches","title":"66. Elisheva deep trenches","class":"media-element file-default"]]},
	pages = {1035},
	abstract = {Directed self-assembly of block copolymers is evolving toward applications that are more\&nbsp;defect-tolerant but still require high morphological control and could benefit from simple, inexpensive\&nbsp;fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer\&nbsp;films on topographically defined substrates leads to hierarchical structures with dual patterns in a\&nbsp;controlled manner and unraveled the dependence of the local morphology on the topographic feature\&nbsp;dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border\&nbsp;of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further\&nbsp;elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control.\&nbsp;It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by\&nbsp;the width of the plateaus becomes a critical factor influencing the local morphology.},
	url = {https://doi.org/10.3390/polym15041035},
	author = {Elisheva Michman and Oded, Meirav and Shenhar, Roy}
}
