@article { ISI:000401161400013,
	title = {Directed self-assembly of block copolymer-based nanocomposites in thin films},
	journal = {Polymers for Advanced Technologies},
	volume = {28},
	number = {5, SI},
	year = {2017},
	month = {MAY},
	pages = {613-622},
	publisher = {WILEY},
	type = {Article},
	address = {111 RIVER ST, HOBOKEN 07030-5774, NJ USA},
	abstract = {Exploiting the full potential of metal and semiconductor nanoparticles for advanced nanotechnological applications requires their organization into predefined structures with high orientational control. Nanofabrication approaches that combine high resolution lithography and self-assembly afford the advantages of accurate placement, compositional diversity, and reduced production costs. This review concentrates on the creation of organized nanoparticle superstructures assisted by recent developments in the directed self-assembly of block copolymers, and delineates possible applications. Copyright (C) 2016 John Wiley \&amp; Sons, Ltd.},
	keywords = {Block copolymers, directed self-assembly, lithography, Nanoparticles},
	issn = {1042-7147},
	doi = {10.1002/pat.3850},
	author = {Michman, E. and Shenhar, R.}
}
