@article {27352,
	title = {Nanoparticle assembly by transient topographyinduced by applying soft lithography to blockcopolymer films},
	journal = {Soft Matter},
	volume = {20},
	year = {2024},
	note = {[["fid":"31226","view_mode":"default","type":"media","attributes":"height":"530","width":"1000","style":"height: 200px; width: 377px;","alt":"67. Meneka transient patterning","title":"67. Meneka transient patterning","class":"media-element file-default"]]},
	pages = {4035-4042},
	abstract = {We present a simple approach for patterning metal nanoparticles into periodic superstructures on flat\&nbsp;films spanning centimeter-square areas. Our approach is based on capillary force lithography, a soft\&nbsp;lithography method that is used to impart topography to molten polymer films, and applies it to block\&nbsp;copolymer films to obtain substrates featuring both topographic and chemical contrasts that can serve as\&nbsp;templates for the selective deposition of nanoparticles. Here we show that flattening the films by\&nbsp;exposure to solvent vapour prior to nanoparticle deposition not only retains chemical heterogeneity but\&nbsp;also provides access to unique hierarchically-organized nanoparticle superstructures that are unattainable\&nbsp;by other methods. Such structures could be useful for optical, sensor, and catalytic applications.},
	url = {https://doi.org/10.1039/d4sm00234b},
	author = {Banik, Meneka and Shenhar, Roy}
}
