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X-Ray Photoelectron Spectroscope Axis Supra | Center for Nanoscience and Nanotechnology

X-Ray Photoelectron Spectroscope Axis Supra

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XPS

Manufacturer and model:

X-Ray Photoelectron Spectroscope Axis Supra (Kratos)

General Information:

The XPS Axis Supra provides elemental and chemical information about the surface region of nearly any solid material including the chemically sensitive materials. Detection of elemental composition as a function of depth is also possible with using ion etching capabilities installed at our instrument. The exceptionally high spectral resolution enables accurate measurement of chemical shifts. The instrument is capable of real time photoelectron imaging of the sample surface. Due to its charge neutralization system the Axis Supra is particularly useful for insulating materials such as polymers, oxides, and powders where charging effects limit other surface techniques. The AXIS Supra has completely automated sample handling that provides exceptionally high analytical throughput.

Key Features:

The XPS Axis Supra has two X-Ray sources - the high-resolution monochromatic Al Kα (1486.7 eV) and Ag Lα (2984.2 eV). In addition to a high resolution spectroscopy with the smallest analyzable spot of 15 μm it provides rapid and high-spatial-resolution parallel imaging with the ultimate spatial resolution of 1 μm at maximum magnification. The instrument is equipped with the Minibeam6 Arn+ Gas Cluster Ion Source (GCIS) to provide a range of options for ion etching. Our instrument has an option for Ultraviolet Photoemission Spectroscopy (UPS). The measurements could be done either at heating up to 800°C or cooling down to -150°C. 

MANUFACTSURER WEBITE

Start of Operation Date:

October 2019