@article {397,
	title = {Monolithic Fringe-Field-Activated Crystalline SiliconTilting-Mirror Devices},
	journal = {JOURNAL OF MICROELECTROMECHANICAL SYSTEMS},
	volume = {12},
	number = {5},
	year = {2003},
	pages = {702-707},
	abstract = {A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9 tilt range device array.},
	url = {http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=1240141},
	author = {Dennis S. Greywall and Chien-Shing Pai and Sang-Hyun Oh and Chorng-Ping Chang and Dan M. Marom and Paul A. Busch and Raymond A. Cirelli and J. Ashley Taylor and Fred P. Klemens and Thomas W. Sorsch and John Eric Bower and Warren Y.-C. Lai and Hyongsok T. Soh}
}
